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Distributed control systems
- Valmet DNA
- Industry specific solutions
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Quality management
- Quality control system (QCS)
- Controls & Applications
- Scanners
- Measurements
- Profilers
- Machine vision
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Analyzers and measurements
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Analyzers
- Brown Stock Quality Analyzer
- Chip 'n' Bark Moisture Analyzer
- Recovery Liquor Analyzer
- Dirt Count Analyzer
- Fiber Image Analyzer
- Kappa Analyzer
- Paper Lab
- MR Moisture
- Pulp Expert
- Fiber Furnish Analyzer
- Retention Measurement
- Stand-Alone Retention Control
- Wet End Analyzer
- Corrosion Reduction Analyzer
- Cooking Liquor Analyzer
- Inline sensors
- Samplers
- Consistency
- Conductivity
- Boiler diagnostics systems
- Wastewater
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Analyzers
- Condition monitoring
- Industrial Internet
- Automation services
- Automation
- Analyzers and measurements
- Inline sensors
- Peroxide Residual Measurement
Valmet Peroxide Residual Measurement
The measurement concept designed in Valmet Peroxide Residual Measurement (Valmet Polarox5 FP) utilizes the proven method, in a new innovative way: it measures both total peroxide residual and OOH– ion residual and thus reveals more intimate information of the process conditions.
Features
The main handicaps of current peroxide stage controls, peroxide over charging caused by low pH or caustic overdosing due to high pH, can be now avoided by measuring total peroxide and OOH– ion ratio online. Based on the enhanced measurement capacity of Valmet Polarox5 FP, new P-stage control concepts can be implemented for best achievable final brightness target with the optimal caustic and peroxide charges.
Benefits
- Unique measurement
- Both active and total peroxide
- Easy and safe installation and start-up